A university micro-nano fabrication laboratory and semiconductor R&D institute applied the Intelligent Spin Coater for photoresist coating, microfluidic film and functional thin film preparation. The machine uses vacuum chuck to hold substrates, supports static/dynamic dispense, and provides 0–9999rpm adjustable speed, stably producing films from 10nm to 100μm thickness.

In actual use, customers precisely control speed, acceleration, time and fluid viscosity to achieve excellent film uniformity and high repeatability. The equipment adopts corrosion-resistant chucks (PP/PTFE optional), compatible with silicon wafer, ITO glass, slide glass and other substrates from 8mm to 20cm. The stable vacuum system avoids flying or shifting, ensuring safe and reliable long-term operation.

Customers widely use it for photolithography, microfluidic chip coating and nano-scale ultra-thin film deposition. The high consistency greatly improves experimental success rate and device yield, making it an essential instrument for micro-nano research and precision processing.

Core Operating Parameters